0100-71313 AMAT 电路板半导体

0100-71313 AMAT 电路板半导体

产品参数

-最大晶圆尺寸:300mm

-工艺室:单晶圆

-气体输送系统:mfc为基础，最多4种气体

-泵系统:涡轮分子泵，干泵和低温泵

-加热系统:石英灯加热

##应用程序

0100-71313AMAT可用于各种半导体制造应用，包括:

-化学气相沉积(CVD)

-物理气相沉积(PVD)

-原子层沉积(ALD)

-等离子蚀刻

-反应离子蚀刻(RIE)

-湿式清洗

0100-71313 AMAT 电路板半导体

Product parameter

- Maximum wafer size :300mm

- Process room: single wafer

- Gas delivery system :mfc based, up to 4 gases

- Pump systems: turbomolecular pumps, dry pumps and cryopumps

- Heating system: quartz lamp heating

## Application

The 0100-71313AMAT can be used in a variety of semiconductor manufacturing applications, including:

- Chemical Vapor Deposition (CVD)

- Physical Vapor Deposition (PVD)

- Atomic Layer Deposition (ALD)

- Plasma etching

- Reactive ion Etching (RIE)

- Wet cleaning

0100-71313 AMAT 电路板半导体

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