BCG450-SD AMAT 半导体专用设备 具有紧凑的占地面积

##技术规范

-型号：BCG450-SD

-产品类型：AMAT

-功耗：450W

-输入电压：220V

-工作温度：5至40摄氏度

-储存温度：-20至60摄氏度

##功能

-高效可靠

-设计紧凑，安装方便

-低噪音和振动

-先进的控制系统可实现最佳性能

-与广泛的应用程序兼容

BCG450-SD是AMAT公司生产的一种专用设备。它是为半导体行业中的高速、高精度晶圆加工而设计的。该设备能够执行多种工艺，包括化学气相沉积（CVD）、等离子体增强CVD（PECVD）、反应离子蚀刻（RIE）和物理气相沉积。

BCG450-SD配备了先进的功能，可以精确控制和监控加工条件，如温度、压力、气流和功率。它还有一个大容量的腔室，可以容纳直径高达450毫米的晶圆，适合大批量生产。

除了技术能力外，BCG450-SD的设计还考虑到了用户的便利性。它有一个用户友好的界面，便于操作和维护。它还具有紧凑的占地面积，从而节省了宝贵的洁净室空间。

BCG450-SD AMAT 半导体专用设备 具有紧凑的占地面积

## Technical specifications

- Model: BCG450-SD

- Product type: AMAT

- Power consumption: 450W

- Input voltage: 220V

- Operating temperature: 5 to 40 degrees Celsius

- Storage temperature: -20 to 60 degrees Celsius

## Function

- Efficient and reliable

- Compact design and easy installation

- Low noise and vibration

- Advanced control system for optimal performance

- Compatible with a wide range of applications

BCG450-SD is a special purpose device manufactured by AMAT Corporation. It is designed for high-speed, high-precision wafer processing in the semiconductor industry. The device is capable of performing a variety of processes, including chemical vapor deposition (CVD), plasma enhanced CVD (PECVD), reactive ion etching (RIE), and physical vapor deposition.

The BCG450-SD is equipped with advanced features to precisely control and monitor processing conditions such as temperature, pressure, airflow and power. It also has a high-capacity chamber that can hold wafers up to 450 mm in diameter, suitable for high-volume production.

In addition to its technical capabilities, the BCG450-SD has been designed with user convenience in mind. It has a user-friendly interface that is easy to operate and maintain. It also has a compact footprint, which saves valuable clean room space.